Fabrication of micro structures on curve surface by X-ray lithography
نویسندگان
چکیده
We demonstrate experimentally the x-ray lithography techniques to fabricate micro structures on curved surfaces such as convex and cylinder surfaces. In order to realize fabricate micro structures on curved surface, two x-ray lithography methods are described. One method is double x-ray exposures method with moving resist stage, the other is flexible mask on curved surface with rotating the resist stage. We also describe two new methods for fabricating a curved surface. One is direct x-ray exposure and the curved surface was obtained by using x-ray Gaussian intensity distribution without LIGA mask. The other one is to produce the concave surface by PCT (Plane Cross section Transfer) method. We believed that the two techniques can also transfer large area submicron size patterns, with a continuous surface relief, onto a curved surface. Research Organization of Science and Engineering, Ritsumeikan University, Kusatsu, Shiga
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